Anisotropic atomic displacement in layered materials under high pressure
نویسندگان
چکیده
منابع مشابه
Atomic-layered MoS2 on SiO2 under high pressure: Bimodal adhesion and biaxial strain effects
R. S. Alencar,1,2 K. D. A. Saboia,2,3 D. Machon,2 G. Montagnac,4 V. Meunier,5 O. P. Ferreira,1 A. San-Miguel,2 and A. G. Souza Filho1 1Departamento de Física, Universidade Federal do Ceará, Fortaleza, Ceará 60455-900, Brazil 2Université de Lyon, F-69000 Lyon, France and Institut Lumière Matière, CNRS, UMR 5306, Université Lyon 1, F-69622 Villeurbanne, France 3Laboratório de Telecomunicações e C...
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ژورنال
عنوان ژورنال: Acta Crystallographica Section A Foundations and Advances
سال: 2019
ISSN: 2053-2733
DOI: 10.1107/s0108767319099033